Description:
Solexir Silica etchant series are SiO2-110A (a Silica etch), SiO2-110B(a Silica Buffer etch) and SiO2-110S (Silica 3Mix Etch) solution. They are based on the hydrofluoric acid solution. Solexir are offering them as a working or concentrated solution.
Application:
Majority of Solexir Silica etchant applications are for etching bare Silica, removing particle residues or for removing traces of photoresist in presence of Silica after application of a photoresist stripper or when utilizing a dry etch. For more information, please contact us.
Cleaning process:
- Process temperature is at room temperature
- Process time is between 20 to 60 sec depending on concentration of HF.
- Mechanically agitating the cleaning solution by Sonication or use of spray system is highly recommended.
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