Solexir is supplying three kinds of photoresist strippers which can create a wide range of selectivity for different lithography process. These three solutions can be summarized as
A. Acidic solution, which is Oaky to be used in absence of any metal year
B. Neutral Solution, which can be used for any process with sensitive layer to pH
C. Alkaline solution for stripping photoresist in high backed
The Benefit of these photoresist strippers can be summarized as follows.
- High Potency
- High thermal Stability
- High Chemical Stability
- High Water Solubility
- High Wet-ability Power: 30 Dyn/Cm
- Wide cleaning applications for peeling different types of Photoresists off of underlaying layers
For more details please see the Solexir photoresist strippers in its product line.