Performance of Post CMP cleaners and their formulation depend on the type of slurry used in polishing process. Therefore, these cleaners may exhibit acidic or basic properties. The most common slurries are Silica, Aluminum Oxide, Cerium and Zirconium Oxides mesh based particles. Solexir offers corresponding cleaning solutions for each of the above slurries as explained below.
Solexir is offering three different kinds of post CMP cleaners: