Solexir-Aluminum etchants series consist of Al-110A, Al-110B and Al-110S. Al-110A is an acidic based solution, Al-110B is an alkaline based solution and Al-110S can be Al-110A or Al-110B, but with surfactant. These acidic/basic/surfactant solutions have different etch rates and surface tensions. Therefore, due to possible existence of complex structures underneath of aluminum layer, Solexir is offering a wide selection of Aluminum etchants solution for different applications. In addition, Solexir offers customized Aluminum etchants for customers who have special needs.
Solexir-Aluminum etchants are used in applications where Aluminum metal layers have been used for inter-connectivity between devices. For more information, please contact us.
- Process Temperature is about 42-45 degrees C.
- Mechanically agitating the cleaning solution, or performing the cleaning process within a Sonication, or use of spray system is highly recommended. Without agitation, due to formation of hydrogen gas which is a byproduct of the etchant, Aluminum cannot be etched uniformly and one can see a lot of island spots on the surface of Aluminum.
- The etch rate for pure Aluminum or various alloys of Aluminum (excluding Copper) is about 10,000 Angstrom per min.
- Etch rate of Aluminum for Copper alloy is about 12,000 Angstrom per min.