The Solexir Post Dry Etch Cleaners are extremely effective solutions for cleaning hard poly-siloxy polymers after a post dry etch, and high temperature baked photoresist.
1- Expose only pre-dried samples to the above solutions
2- Allow between 30 sec to 2 minutes processing time, where the duration depends on the structure of the hard polymers
3- Process temperature is room temperature
4- Mechanical agitation or Sonication process is necessary in this cleaning process.
5- After cleaning process, rinse samples very well with warm Di-water.
6- Immediately dry the samples to eliminate any possible airborne contamination.