In general, photoresist developers have different selectivity and performance in relation to the cleaning process depending on their concentration. Usually a high concentrated developer has a higher sensitivity, but with a lower contrast.  On the other hand, pre-diluted photoresist developers, based on their dilution ratio, can provide higher contrasts and create better selectivity between exposed and unexposed resist.

Solexir supplies two series of photoresist developers:  Solexir 400PRD and Solexir 420PRD.

These two series allow a wide range of selectivity for different lithography process:

  • Solexir developer 400PRD series, which can be used for developing photoresist in presence of pH sensitive layers
  • Solexir developer 420PRD series, which can be used for developing photoresist in presence of pH insensitive layers
  1. High Potency
  2. High thermal Stability
  3. High Chemical Stability
  4. High Water Solubility
  5. High Wet-ability Power: 350 Dyn/Cm
  6. Nonflammable

For more details please see the Solexir photoresist developer in its product line.