![Made in the USA badge isolated on white background.](https://solexir.com/wp-content/uploads/2020/07/made_in_usa_small.jpg)
![Photoresist_Developer_Text](https://solexir.com/wp-content/uploads/2019/05/Photoresist_Developer_Text.png)
In general, photoresist developers have different selectivity and performance in relation to the cleaning process depending on their concentration. Usually a high concentrated developer has a higher sensitivity, but with a lower contrast. On the other hand, pre-diluted photoresist developers, based on their dilution ratio, can provide higher contrasts and create better selectivity between exposed and unexposed resist.
Solexir supplies two series of photoresist developers: Solexir 400PRD and Solexir 420PRD.
These two series allow a wide range of selectivity for different lithography process:
- Solexir developer 400PRD series, which can be used for developing photoresist in presence of pH sensitive layers
- Solexir developer 420PRD series, which can be used for developing photoresist in presence of pH insensitive layers
![Particle_Residue_Cleaner](https://solexir.com/wp-content/uploads/2017/12/Particle_Residue_Cleaner.png)
![Photoresist_Developer_Benefits_Text](https://solexir.com/wp-content/uploads/2019/05/Photoresist_Developer_Benefits_Text.png)
- High Potency
- High thermal Stability
- High Chemical Stability
- High Water Solubility
- High Wet-ability Power: 350 Dyn/Cm
- Nonflammable
For more details please see the Solexir photoresist developer in its product line.