In general, photoresist developers have different selectivity and performance in relation to the cleaning process depending on their concentration. Usually a high concentrated developer has a higher sensitivity, but with a lower contrast. On the other hand, pre-diluted photoresist developers, based on their dilution ratio, can provide higher contrasts and create better selectivity between exposed and unexposed resist.
Solexir supplies two series of photoresist developers: Solexir 400PRD and Solexir 420PRD.
These two series allow a wide range of selectivity for different lithography process:
- Solexir developer 400PRD series, which can be used for developing photoresist in presence of pH sensitive layers
- Solexir developer 420PRD series, which can be used for developing photoresist in presence of pH insensitive layers