Description:

Solexir Silica etchant series are SiO2-110A (a Silica etch), SiO2-110B(a Silica Buffer etch) and SiO2-110S (Silica 3Mix Etch) solution.  They are based on the hydrofluoric acid solution. Solexir are offering them as a working or concentrated solution.

Application:

Majority of Solexir Silica etchant applications are for etching bare Silica, removing particle residues or for removing traces of photoresist in presence of Silica after application of a photoresist stripper or when utilizing a dry etch.   For more information, please contact us.

Cleaning process:

  • Process temperature is at room temperature
  • Process time is between 20 to 60 sec depending on concentration of HF.
  • Mechanically agitating the cleaning solution by Sonication or use of spray system is highly recommended.

Contact Us!

Contact Us!