Description:
Solexir 420PRD is a pre-mixed combination of a positive photoresist developer and a Surfactant.
Application:
In general, photoresist developers have different selectivity and performance in relation to the cleaning process depending on their concentration. Usually a high concentrated developer has a higher sensitivity, but with a lower contrast. On the other hand, pre-diluted photoresist developers, based on their dilution ratio, can provide higher contrasts and create better selectivity between exposed and unexposed resist. Naturally, when one decides to use a diluted photoresist developer, a longer development time has to be tolerated. For more information, please contact us.
Cleaning process:
- Process Temperature has to be maintained between 20 to 25 degrees C with a variation of not more than 1 degree C.
- Mechanically agitating the cleaning solution or performing the cleaning process within a Sonication or use of spray developer system is highly recommended.
- It must be noted that the effective concentration of photoresist developers will affect the developing time and contrast.
- Solexir 420PRD, due to its higher pH, CANNOT be applied in processes where pH sensitive metal lines, such as Aluminum, are present.
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