Solexir 420PRD is a pre-mixed combination of a positive photoresist developer and a Surfactant.


In general, photoresist developers have different selectivity and performance in relation to the cleaning process depending on their concentration. Usually a high concentrated developer has a higher sensitivity, but with a lower contrast.  On the other hand, pre-diluted photoresist developers, based on their dilution ratio, can provide higher contrasts and create better selectivity between exposed and unexposed resist. Naturally, when one decides to use a diluted photoresist developer, a longer development time has to be tolerated.  For more information, please contact us.

Cleaning process:

  • Process Temperature has to be maintained between 20 to 25 degrees C with a variation of not more than 1 degree C.
  • Mechanically agitating the cleaning solution or performing the cleaning process within a Sonication or use of spray developer system is highly recommended.
  • It must be noted that the effective concentration of photoresist developers will affect the developing time and contrast.
  • Solexir 420PRD, due to its higher pH, CANNOT be applied in processes where pH sensitive metal lines, such as Aluminum, are present.

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